The famous Moore’s Law has guided the advance of Silicon based electronics for almost 40 years. As the sizes of transistors continue shrinking down, it will reach its limit soon. To overcome the scaling problem, research on nanoscale electronic materials and their assembly becomes very crucial. In our group, Chemical Vapor Deposition (CVD) system and Molecular Beam Epitaxy (MBE) system are used to synthesize high quality semiconducting nanowires (NWs) and single-walled carbon nanotubes (SWNTs). These nanoscale materials are attracting because of their superior properties for nano-electronic applications. Advanced lithography techniques, such as Ebeam lithography and nano-imprinting, are developed to fabricate ultrahigh density NW and SWNT transistors and integrated circuits.
